JPH0436360B2 - - Google Patents

Info

Publication number
JPH0436360B2
JPH0436360B2 JP58112310A JP11231083A JPH0436360B2 JP H0436360 B2 JPH0436360 B2 JP H0436360B2 JP 58112310 A JP58112310 A JP 58112310A JP 11231083 A JP11231083 A JP 11231083A JP H0436360 B2 JPH0436360 B2 JP H0436360B2
Authority
JP
Japan
Prior art keywords
ray
rays
intensity distribution
wafer
uniform
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58112310A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6084814A (ja
Inventor
Koichiro Ootori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP58112310A priority Critical patent/JPS6084814A/ja
Publication of JPS6084814A publication Critical patent/JPS6084814A/ja
Publication of JPH0436360B2 publication Critical patent/JPH0436360B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Particle Accelerators (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
JP58112310A 1983-06-22 1983-06-22 Ｘ線投射装置 Granted JPS6084814A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58112310A JPS6084814A (ja) 1983-06-22 1983-06-22 Ｘ線投射装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58112310A JPS6084814A (ja) 1983-06-22 1983-06-22 Ｘ線投射装置

Publications (2)

Publication Number Publication Date
JPS6084814A JPS6084814A (ja) 1985-05-14
JPH0436360B2 true JPH0436360B2 (en]) 1992-06-15

Family

ID=14583471

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58112310A Granted JPS6084814A (ja) 1983-06-22 1983-06-22 Ｘ線投射装置

Country Status (1)

Country Link
JP (1) JPS6084814A (en])

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH025334A (ja) * 1988-06-23 1990-01-10 Toshiba Corp Ｘ線装置
DE68927430T2 (de) 1988-09-02 1997-03-13 Canon K.K., Tokio/Tokyo Belichtungseinrichtung

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5034702U (en]) * 1973-07-27 1975-04-14

Also Published As

Publication number Publication date
JPS6084814A (ja) 1985-05-14

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